Realistic mask generation for matter-wave lithography via machine learning

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Authors: Johannes Fiedler, Adriá Salvador Palau, Eivind Kristen Osestad, Pekka Parviainen and Bodil Holst

Journal title: Machine Learning: Science and Technology

Journal publisher: IOP Publishing

Published year: 2023

DOI identifier: 10.1088/2632-2153/acd988

ISSN: 2632-2153