Depth-distribution of resistivity within ion-irradiated semiconductor layersrevealed by low-kV scanning electron microscopy

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Authors: I. Jóźwik, J. Jagielski, P. Ciepielewski, E. Dumiszewska, K. Piętak-Jurczak, M. Kamiński, U. Kentsch

Journal title: Materials Science in Semiconductor Processing

Journal number: 70(2023)

Journal publisher: Pergamon Press

Published year: 2023

Published pages: 1-6; 107640

DOI identifier: 10.1016/j.mssp.2023.107640

ISSN: 1369-8001