Impact of monolayer WS2 surface properties on the gate dielectrics formation by atomic layer deposition

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Authors: Zaoyang Lin, Sven Dekelver, Daire Cott, Benjamin Groven, Stefanie Sergeant, Thierry Conard, Xiangyu Wu, Pierre Morin, Dennis Lin, Cesar Javier Lockhart de la Rosa, Gouri Sankar Kar, Annelies Delabie

Journal title: Journal of Vacuum Science & Technology A

Journal number: 42

Journal publisher: American Institute of Physics

Published year: 2024

DOI identifier: 10.1116/6.0003894

ISSN: 0734-2101