Towards low damage and fab-compatible top-contacts in MX₂ transistors using a combined synchronous pulse atomic layer etch and wet-chemical etch approach

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Authors: S. Kundu, D. H. van Dorp, T. Schram, Q. Smets, S. Banerjee, B. Groven, D. Cott, S. Decoster, P. Bezard, F. Lazzarino, K. Banerjee, S. Ghosh, J. F. de Marneffe, P. Morin, C. J. L. de La Rosa, I. Asselberghs, G. S. Kar

Journal title: 2023 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits)

Journal publisher: IEEE

Published year: 2023

Published pages: 1-2

DOI identifier: 10.23919/vlsitechnologyandcir57934.2023.10185413