Growth and performance of n++ GaN cap layer for HEMTs applications

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Authors: J. Kuzmk, M. Blaho, D. Greguov, P. Eli, O. Pohorelec, S. Hasenhrl, . Hak, F. Gucmann, Z. Zpran, E. Dobroka, M. Kyambaki, G. Konstantinidis

Journal title: Materials Science in Semiconductor Processing

Journal number: 185

Journal publisher: Elsevier BV

Published year: 2024

DOI identifier: 10.1016/j.mssp.2024.108959

ISSN: 1369-8001