Electrical Characterization of HfO2 Dielectric Films Deposited by ALD for RF-MEMS Capacitive Switches

This is a publication. If there is no link to the publication on this page, you can try the pre-formated search via the search engines listed on this page.

Authors: J. Theocharis, J. P. Martins,A. Mahjoub,E. Eustache, A. Ziaei and G. Papaioannou

Journal publisher: None

Published year: 2024